Zirconium oxide surface passivation of crystalline silicon

Superacid Passivation of Crystalline Silicon Surfaces.

The reduction of parasitic recombination processes commonly occurring within the silicon crystal and at its surfaces is of primary importance in crystalline silicon devices, particularly in photovoltaics. Here we explore a simple, room temperature treatment, involving a nonaqueous solution of the superacid bis(trifluoromethane)sulfonimide, to temporarily deactivate recombination centers at the ...

Amorphous Silicon Compound Films for Surface Passivation and Antireflection Coating of Crystalline Silicon Solar Cells

This chapter gives an overview of the theoretical bases of surface passivation and antireflection coating and describes the methods and equipment used to characterize the layers created in this work. While surface passivation is quantified by the effective surface recombination velocity Seff , this parameter cannot be measured directly. Instead, the lifetime measurements by QSSPC and ”PCD carri...

Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films C.Voz

In this work we study the electronic surface passivation of crystalline silicon with intrinsic thin silicon films deposited by Catalytic CVD. The contactless method used to determine the effective surface recombination velocity was the Quasi-Steady-State Photoconductance technique. Hydrogenated amorphous and nanocrystalline silicon films were evaluated as passivating layers on nand p-type float...

Surface passivation of black silicon phosphorus emitters

ii Abstract (in Finnish) iiiin Finnish) iii

Al2O3/TiO2 stack layers for effective surface passivation of crystalline silicon